Our vision is to transform how the world uses information to enrich life for all.
Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever.
As a Sr Engineer, Photo EUV Technology, you will be responsible for EUV process module development for memory devices, in addition to other photolithography and process integration related activities. In this position, you will work with other Micron engineers, technology partners and vendors to develop unit processes that meet device requirements for next-generation semiconductors. You will be ultimately responsible for a successful introduction of new technology to manufacturing, driving Yield improvement/CT reduction/tool expansion towards mature cumulative yield. Advanced process development tasks will include performing material evaluations; reticle, layout and OPC development; process window analysis; and overlay optimization.
We work in a highly collaborative environment with R&D and HVM (high volume manufacturing) partners in globally diverse geographic locations
You will collaborate closely with other DRAM Development site leaders to align on development strategies, deliverables and provide on-site support to drive various technology development projects. In this role, you will also partner closely with Micron’s Manufacturing and Central teams to apply best in class methods to develop for manufacturability.
Responsibilities: Understanding of optics including the principles and application of EUV lithography.
Experience with chemical process specific to lithography, including various materials used in substrate preparation and coated materials for use in 365 nm, 248 nm, 193nm, and EUV lithography
EUV defect analysis and defense line build up
Deep knowledge of lithography simulation software and application to state of art high resolution imaging
Possess skills and experience with material properties and characterization techniques in development of photolithography processes
Overlay analysis and improvement
Supporting cross-functional failure analysis and yield improvement.
Supporting root cause defect and unique fail mode analysis.
Leverage across node learning to develop for manufacturability
Maintain area procedures and training required to ensure legal compliance and conformance to a management system
